This type of design that you can only get from knowledgeable ALD experts, optimizes deposition uniformity and minimizes cycle time and precursor use. The Fiji 200 comes in several different ...

Atomic layer deposition (ALD) is a process used to deposit a wide variety ... First, a precursor is pumped into a vacuum chamber to allow it to completely react with the substrate surface so that lays ...

The HELIOS coating systems bring atomic-level control, film quality and conformal performance of ALD to commercial manufacturing ... The typical size of a chamber ranges from 1.5 to 80 L or up to 1 x ...